GEW (EC) has incorporated nitrogen into its N2 UV lamphead system for inert gas atmosphere curing of inks and coatings. The technology has been coupled with GEW’s e-Brick electronic power supply which together, the company says, will reduce power consumption by 30 per cent while obtaining a 20 per cent boost in UV output. The addition of nitrogen is also said to improve the degree of cure and increases processing speed.
GEW managing director Malcolm Rae says: “The inert system addresses the increasing use of UV inks and coating chemistry for food, cosmetic and pharmaceutical applications. We have continued to refine the N2 product and over the last few years we have supplied a number of systems for applications that include silicone release coatings and varnishing of thermal activated substrates for labels and food packaging.
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